Gallium Nitride High Electron Mobility Transistors (GaN HEMTs) adopt a pGaN architecture, featuring normally-off characteristics. Compared to equivalent silicon (Si) devices, they exhibit gate and output charges that are an order of magnitude lower. Combined with virtually zero reverse recovery charge, these attributes enable simpler circuit topologies and higher system efficiency.
Previous:SiC MOSFET
Next:NO
Telephone:(0755) 8297-4436
Address: 304C, Block B, Garden City Digital Building, No. 1079 Nanhai Avenue, Nanshan District, Shenzhen, Guangdong, China
Copyright © 2025 Pinxin Electronics (Shenzhen) Co., Ltd. All rights reserved